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Influence of the Drain Bias and Gate Length of Partially Depleted SOI MOSFETs on the ZTC Biasing Point

机译:漏极偏置和栅极长度对ZTC偏置点的部分耗尽SOI MOSFET的影响

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This paper presents the influence of the drain bias and gate length of partially depleted SOI MOSFETs on the Zero Temperature Coefficient (ZTC) for devices operating at high temperatures (from room temperature up to 573K). The analysis takes into account temperature dependent model parameters such as threshold voltage and mobility. The analytical predictions are in very close agreement with experimental results in spite of the simplification used for the V{sub}(ZTC) model as a function of temperature in the linear and the saturation region.
机译:本文介绍了在高温下操作的零温度系数(ZTC)上部分耗尽的SOI MOSFET的漏极偏置和栅极长度的影响(从室温高达573K)。该分析考虑了诸如阈值电压和移动性等温度相关的模型参数。尽管V {Sub}(ZTC)模型作为线性和饱和区域中的温度的函数,但分析预测仍然与实验结果非常密切地与实验结果相吻合。

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