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Influence of the Drain Bias and Gate Length of Partially Depleted SOI MOSFETs on the ZTC Biasing Point

机译:部分耗尽的SOI MOSFET的漏极偏置和栅极长度对ZTC偏置点的影响

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摘要

This paper presents the influence of the drain bias and gate length of partially depleted SOI MOSFETs on the Zero Temperature Coefficient (ZTC) for devices operating at high temperatures (from room temperature up to 573K). The analysis takes into account temperature dependent model parameters such as threshold voltage and mobility. The analytical predictions are in very close agreement with experimental results in spite of the simplification used for the V_(ZTC) model as a function of temperature in the linear and the saturation region.
机译:本文介绍了部分耗尽的SOI MOSFET的漏极偏置和栅极长度对在高温下(从室温到573K)工作的器件的零温度系数(ZTC)的影响。该分析考虑了与温度有关的模型参数,例如阈值电压和迁移率。尽管将V_(ZTC)模型简化为线性和饱和区域中温度的函数,但分析预测与实验结果非常吻合。

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