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The distorted helix : Thin film extraction from scanning white light interferometry

机译：扭曲的螺旋线：从扫描白光干涉法中提取薄膜

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摘要

Scanning white light interferometry (SWLI) is now an established technique for the measurement of surface topography. It has the capability of combining sub-nanometre interferometric resolution with a range limited only by the z-traverse, typically at least 100μm. A very useful extension to its capability is the ability to measure thin films on a local scale. For films with thicknesses in excess of ～ 2 μm (depending on refractive index), the SWLI interaction with the film leads simply the formation of two localised fringe bunches, each corresponding to a surface interface. It is evidently relatively trivial to locate the positions of these two envelope maxima and therefore determine the film thickness, assuming the refractive index is known. For thin films (with thicknesses ～ 20nm to ～ 2μm, again depending on the index), the SWLI interaction leads to the formation of a single interference maxima. In this context, it is appropriate to describe the thin film structure in terms of optical admittances; it is this regime that is addressed through the introduction of a new function, the 'helical conjugate field' (HCF) function. This function may be considered as providing a 'signature' of the multilayer measured so that through optimization, the thin film multilayer may be determined on a local scale. Following the derivation of the HCF function, examples of extracted multilayer structures are presented. This is followed by a discussion of the limits of the approach.
机译：扫描白光干涉法（SWLI）现在是一种用于测量表面形貌的成熟技术。它具有将亚纳米干涉测量分辨率与仅受z横移限制的范围（通常至少100μm）相结合的能力。对其功能的非常有用的扩展是在局部范围内测量薄膜的能力。对于厚度超过〜2μm（取决于折射率）的薄膜，SWLI与薄膜的相互作用仅导致形成两个局部条纹束，每个条纹束对应于一个表面界面。假定折射率是已知的，那么找到这两个包络最大值的位置并因此确定膜厚度显然是相对简单的。对于薄膜（厚度〜20nm〜〜2μm，又取决于折射率），SWLI相互作用导致形成单个干涉最大值。在这种情况下，以光导纳来描述薄膜结构是适当的；通过引入新功能“螺旋共轭场”（HCF）功能可以解决该问题。该功能可以被认为是提供所测量的多层的“签名”，从而通过优化，可以在局部规模上确定薄膜多层。在推导HCF函数之后，给出了提取的多层结构的示例。接下来是对方法局限性的讨论。

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