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The distorted helix : Thin film extraction from scanning white light interferometry

机译:扭曲的螺旋:薄膜提取扫描白光干涉测量

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Scanning white light interferometry (SWLI) is now an established technique for the measurement of surface topography. It has the capability of combining sub-nanometre interferometric resolution with a range limited only by the z-traverse, typically at least 100μm. A very useful extension to its capability is the ability to measure thin films on a local scale. For films with thicknesses in excess of ~ 2 μm (depending on refractive index), the SWLI interaction with the film leads simply the formation of two localised fringe bunches, each corresponding to a surface interface. It is evidently relatively trivial to locate the positions of these two envelope maxima and therefore determine the film thickness, assuming the refractive index is known. For thin films (with thicknesses ~ 20nm to ~ 2μm, again depending on the index), the SWLI interaction leads to the formation of a single interference maxima. In this context, it is appropriate to describe the thin film structure in terms of optical admittances; it is this regime that is addressed through the introduction of a new function, the 'helical conjugate field' (HCF) function. This function may be considered as providing a 'signature' of the multilayer measured so that through optimization, the thin film multilayer may be determined on a local scale. Following the derivation of the HCF function, examples of extracted multilayer structures are presented. This is followed by a discussion of the limits of the approach.
机译:扫描白光干涉测量(SWLI)现在是用于测量表面形貌的建立技术。它具有将子纳米干涉式分辨率组合的能力仅通过Z横向限制,通常至少为100μm。其能力的非常有用的扩展是能够在本地规模上测量薄膜。对于具有超过〜2μm的厚度的薄膜(取决于折射率),与膜的SWLI相互作用仅仅形成两个局部条纹束的形成,每个局部界面对应于表面界面。假设折射率是已知的,显然是为了定位这两个包络最大值的位置并且因此确定薄膜厚度来确定膜厚度。对于薄膜(厚度〜20nm至约2μm,根据指数再次取决于指数),SWLI相互作用导致形成单个干扰最大值。在这种情况下,在光学进料方面适用于描述薄膜结构;通过引入新功能,“螺旋共轭场”(HCF)函数来解决这一制度。该功能可以被认为是提供多层测量的“签名”,使得通过优化,可以在本地刻度上确定薄膜多层。在HCF函数的推导之后,提出了提取的多层结构的示例。然后讨论方法的限制。

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