We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50 nm features over a 2 X 2 cm~2 area which are reproducible with high fidelity. Data of printing 15 nm features in PMMA using a Cr stamp was obtained.
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机译：我们回顾了纳米压印光刻技术的重要方面，并考虑了其在成为标准制造技术时所面临的挑战，例如成本和产量。我们讨论材料问题，例如粘弹性和印刷材料的功能性。通过说明，我们介绍了在2 X 2 cm〜2区域上50 nm特征的打印结果，这些结果可以高保真度再现。获得了使用Cr压模在PMMA中印刷15 nm特征的数据。
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