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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Metrology delay time reduction in lithography via small-lot wafer transport
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Metrology delay time reduction in lithography via small-lot wafer transport

机译：通过小批量晶圆传输减少光刻的计量延迟时间

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摘要

A small lot Automated Material Handling System (AMHS) is presented as a method to reduce the time between wafer exposure at a photolithography tool and collection of metrology / inspection data. A new AMHS system that is capable of the move rates required by small lot wafer transport is described, its implementation in a photolithography bay is explained, and the resulting reduction in metrology delay time is quantified. In addition, a phased implementation approach is described in which some, but not all, components of the new AMHS would be installed in existing fabs to enhance the move rate capability of traditional overhead transport (OHT) AMHS systems. This partial implementation would enable a partial lot size reduction and corresponding metrology delay time reduction of 60-70%. The full AMHS solution would be installed in new fabs and enable true small lot manufacturing in the litho area and would result in the maximum delay time reduction of 75-85%.
机译：提出了一种小批量的自动材料处理系统（AMHS），作为减少在光刻工具上曝光晶圆与收集计量/检查数据之间的时间的方法。描述了一种新的AMHS系统，该系统能够实现小批量晶圆运输所需的移动速率，并说明了其在光刻区中的实现方式，并对量化延迟时间的减少进行了量化。此外，还介绍了一种分阶段实施的方法，其中将在现有工厂中安装新AMHS的一些（但不是全部）组件，以增强传统架空运输（OHT）AMHS系统的移动速率能力。这种部分实现将能够部分减少批量大小，并相应地将计量延迟时间减少60-70％。完整的AMHS解决方案将安装在新的晶圆厂中，并能在光刻领域实现真正的小批量生产，并且将最大程度地减少75-85％的延迟时间。

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