首页> 外文期刊>International journal of nonlinear sciences and numerical simulation >Application of Car-Parrinello Molecular Dynamics to Ga-rich GaN Buffer Layer for Stress Relaxation in GaN Grown Layer
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Application of Car-Parrinello Molecular Dynamics to Ga-rich GaN Buffer Layer for Stress Relaxation in GaN Grown Layer

机译:Car-Parrinello分子动力学在富Ga GaN缓冲层中缓解GaN生长层应力中的应用

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摘要

An atomic scale modeling of nitrogen vacancies in Ga-rich gallium nitride (GaN) buffer layer was conducted by Car-Parrinello molecular dynamics (CPMD) method in the frame of density functional theory (DFT), and stress tensors in defective bulk gallium nitride were calculated. The results indicated that the gallium nitride buffer layer with lots of nitrogen vacancies facilitated stress relaxation and tensile stress reduction in epitaxy layer. The compressive stress in the gallium nitride buffer layer was increased with the decrease of the N/Ga ratio. The modeling of nitrogen vacancies in gallium nitride has provided some new insights into tensile stress reduction by Ga-rich gallium nitride buffer layer on atomic level.
机译:在密度泛函理论(DFT)的框架下,通过Car-Parrinello分子动力学(CPMD)方法对富含Ga的氮化镓(GaN)缓冲层中的氮空位进行了原子尺度的建模,缺陷氮化镓的应力张量为计算。结果表明,具有大量氮空位的氮化镓缓冲层有助于外延层的应力松弛和张应力的减小。随着N / Ga比的降低,氮化镓缓冲层中的压缩应力增加。氮化镓中氮空位的建模为原子级富Ga氮化镓缓冲层降低张应力提供了一些新见识。

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